SPRINT

Sevim S., Franco C., Liu H., Roussel H., Rapenne L., Rubio‐Zuazo H., Chen X.Z., Pané S., Muñoz‐Rojas D., deMello A.J., Puigmartí‐Luis J. (2019). In‐Flow MOF Lithography. Advanced Materials and Technologies; 4(6): 1800666.

Muñoz-Rojas D., Maindron T., Esteve A., Piallat F., Kools J.C.S., Decams J. (2019). Speeding up the unique assets of atomic layer deposition. Materials Today Chemistry; 12: 96-120.

Velásquez-Hernández M.D.J., Ricco R., Carraro F., Limpoco F.T., Linares-Moreau M., Leitner E., Wiltsche H., Rattenberger J., Schröttner H., Frühwirt P., Stadler E.M., Gescheidt G., Amenitsch H., Doonan C.J., Falcaro P. (2019). Degradation of ZIF-8 in phosphate buffered saline media. CrystEngComm; 21: 4538.

Astria E., Thonhofer M., Ricco R., Liang W., Chemelli A., Tarzia A., Alt K., Hagemeyer C.E., Rattenberger J., Schroettner H., Wrodnigg T., Amenitsch H., Huang D.M., Doonan C.J., Falcaro P. (2019) Carbohydrates@MOFs. Materials Horizons; 6(5): 969-977.

Velásquez-Hernández M., Astria E., Winkler S., Weibin L., Wiltschec H., Poddar A., Shukla R., Prestwich G., Paderi J., Salcedo-Abraira P., Amenitsch H., Horcajada P., Doonan C.J., Falcaro P. (2020) Modulation of metal-azolate frameworks for the tunable release of encapsulated glycosaminoglycans. Chemical Science; 11: 10835-10843.

de la Huerta C.A.M., Nguyen V.H., Sekkat A., Crivello C., Toldra‐Reig F., Veiga P.B., Quessada S., Jimenez C., Muñoz‐Rojas D. (2020). Gas‐phase 3D printing of functional materials. Advanced Materials Technologies; 5(12): 2070074.

Tu M, Xia B, Kravchenko DE, Tietze ML, Cruz AJ, Stassen I, Hauffman T, Teyssandier J, De Feyter S, Wang Z, Fischer RA, Marmiroli B, Amenitsch H, Torvisco A, Velásquez-Hernández MJ, Falcaro P, Ameloot R. (2021). Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks. Nature Materials; 20: 93-99.

Crivello C., Sevim S., Graniel O., Franco C., Pané S., Puigmartí-Luis J., Muñoz-Rojas D. (2021). Advanced technologies for the fabrication of MOF thin films. Materials Horizons; 8(1): 168-178.

Nguyen V.H., Sekkat A., Arturo C., de la Huerta M., Zoubian F., Crivello C., Rubio-Zuazo J., Jaffal M., Bonvalot M., Vallée C., Aubry O., Rabat H., Hong D., Muñoz-Rojas D. (2020). Atmospheric plasma-enhanced spatial chemical vapor deposition of SiO2 using trivinylmethoxysilane and oxygen plasma. Chemistry of Materials; 32(12): 5153-5161.

Muñoz-Rojas D., Nguyen V.H., Masse de la Huerta C., Jiménez C., Bellet D. (2019). Spatial atomic layer deposition. In: Mandracci P. (Ed), Chemical Vapor Deposition for Nanotechnology. IntechOpen. London, UK.

Thin layer materials: SPRINT project aims high. Published in the MINATEC Newsletter.

Atomic layer deposition reinvented. Press release about new developments in the SPRINT project published in the journal Advanced Materials Technologies.

New SALD pen could improve deposition. Published in the MINATEC Newsletter.

Presentation template

Poster template